Published Technical Disclosure Archive

Silicon Nitride Pathogen Control: Multi-Industry Solution

Publication ID: 24-11857001_0002_PTD
Published: October 27, 2025
Category:New Applications & Use Cases

Legal Citation

pr1or.art Inc., “Silicon Nitride Pathogen Control: Multi-Industry Solution,” Published Technical Disclosure No. 24-11857001_0002_PTD, Published October 27, 2025, available at https://archive.pr1or.art/24-11857001_0002_PTD
This technical disclosure describes improvements that would be readily apparent to a Person Having Ordinary Skill In The Art (PHOSITA) when considered in combination with the foundational architecture disclosed in U.S. Patent No. 11,857,001.

Background and Problem Solved

The original patent addressed the need for safe and reliable inactivation, removal, or lysis of viruses, bacteria, and fungi in face masks. However, the limitations of this technology were confined to the face mask industry. This new invention tackles the broader problem of microbial growth and pathogen control in diverse industries, including agriculture, food processing, water treatment, medical devices, and environmental safety.

Novelty and Inventive Step

The new claims introduce novel applications of silicon nitride technology beyond face masks, demonstrating an inventive step in expanding the technology's scope to diverse industries. The use of silicon nitride in these new applications is non-obvious and addresses specific problems in each industry.

Alternative Embodiments and Variations

Alternative embodiments of the invention may include varying the concentration of silicon nitride powder, using different types of silicon nitride compositions, or combining silicon nitride with other materials to enhance its effectiveness. Additionally, the invention could be adapted for use in other industries, such as textiles, construction materials, or cosmetics.

Potential Commercial Applications and Market

The invention has significant commercial potential in various industries, including agriculture, food processing, water treatment, medical devices, and environmental safety. The market for silicon nitride-based solutions is vast, with potential applications in industries worth trillions of dollars. The invention's ability to address microbial growth and pathogen control in diverse industries positions it for significant market share and revenue growth.

CPC Classifications

SectionClassGroup
A A41 A41D13/1192
D D06 D06B13/00
D D06 D06M11/77
A A41 A41D2500/30
D D06 D06M2101/20
D D10 D10B2501/04

Field of Art

Antimicrobial materials science, with expertise in nanotechnology, surface engineering, and pathogen inactivation techniques across medical, agricultural, and environmental applications

Person of Ordinary Skill (PHOSITA) Profile

A materials scientist or chemical engineer with advanced degree, experienced in nanomaterial functionalization, surface modification techniques, and understanding of silicon nitride's antimicrobial properties

Obviousness Rationale

A PHOSITA would recognize silicon nitride's inherent antimicrobial properties demonstrated in the source patent and understand its potential for broad application across multiple domains. The PTD's variations represent predictable extensions of the core technology by applying known antimicrobial mechanisms to different surface contexts. The concentration ranges and application methods are consistent with standard materials engineering approaches for implementing nanomaterial-based treatments.

Obvious Combinations & Variations

Source Patent Element
Silicon nitride powder embedded in fibrous material for pathogen inactivation
PTD Variation
Agricultural surface coating using similar silicon nitride concentration ranges
Obviousness Reasoning
Predictable application of known antimicrobial mechanism to prevent microbial growth on alternative surfaces
Source Patent Element
Face mask with silicon nitride for virus/bacteria reduction
PTD Variation
Water filtration system using silicon nitride-based filter
Obviousness Reasoning
Known nanomaterial filtration technique applied to different liquid/environmental context with expected antimicrobial performance
Source Patent Element
Fibrous material layer with embedded silicon nitride
PTD Variation
Medical implant device coated with silicon nitride composition
Obviousness Reasoning
Logical extension of antimicrobial surface treatment technique to medical device context with predictable infection reduction outcomes
Source Patent Element
Concentration of silicon nitride between 1-10 wt%
PTD Variation
Varying silicon nitride concentration from 0.1-10 wt% across different applications
Obviousness Reasoning
Design choice within known effective concentration ranges, representing routine materials engineering optimization
35 U.S.C. § 103 Summary: Based on US Patent 11857001's teachings regarding silicon nitride's antimicrobial properties, the present publication demonstrates that a Person Having Ordinary Skill In The Art would find the disclosed variations obvious through predictable application of known nanomaterial surface modification techniques across diverse technological domains, thereby rendering subsequent claims involving similar antimicrobial material implementations anticipated and non-patentable.

Original Patent Information

Patent NumberUS 11,857,001
TitleAntipathogenic face mask
Assignee(s)SINTX Technologies, Inc.