Advanced Customizable Antipathogenic Face Mask Tech

Publication ID: 24-11857001_0010_PTD
Published: October 27, 2025
Category:Future Evolutions & Paradigm Shifts

Legal Citation

pr1or.art Inc., “Advanced Customizable Antipathogenic Face Mask Tech,” Published Technical Disclosure No. 24-11857001_0010_PTD, Published October 27, 2025, available at https://archive.pr1or.art/24-11857001_0010_PTD
This technical disclosure describes improvements that would be readily apparent to a Person Having Ordinary Skill In The Art (PHOSITA) when considered in combination with the foundational architecture disclosed in U.S. Patent No. 11,857,001.

Background and Problem Solved

The original antipathogenic face mask patent, while effective, has limitations in terms of customization, adaptability, and environmental sustainability. The present invention addresses these limitations by introducing a system that can detect the user's facial geometry and skin type, fabricate a customized mask body, and optimize the mask's antipathogenic properties based on the user's health profile.

Novelty and Inventive Step

The new claims introduce a paradigm shift in face mask technology by incorporating advanced technologies such as 3D printing, sensors, and real-time pathogen detection, which are not present in the original patent. The invention's focus on customization, adaptability, and environmental sustainability represents a significant departure from traditional face mask designs.

Alternative Embodiments and Variations

Alternative embodiments of the invention could include the use of different materials, such as graphene or nanocellulose, for the mask body and filter modules. The system could also be integrated with other wearable devices or health monitoring systems to provide a more comprehensive health solution. Additionally, the invention could be adapted for use in various industries, such as healthcare, aerospace, or construction.

Potential Commercial Applications and Market

The invention has significant commercial potential in the healthcare and personal protective equipment industries, particularly in the context of pandemic preparedness and response. The market for advanced face mask technologies is expected to grow rapidly in the coming years, driven by increasing concerns about public health and environmental sustainability.

CPC Classifications

SectionClassGroup
A A41 A41D13/1192
D D06 D06B13/00
D D06 D06M11/77
A A41 A41D2500/30
D D06 D06M2101/20
D D10 D10B2501/04

Original Patent Information

Patent NumberUS 11,857,001
TitleAntipathogenic face mask
Assignee(s)SINTX Technologies, Inc.