Published Technical Disclosure Archive

Enhanced Direct Improvements & Enhancements Technical Implementation

Publication ID: 24-11858091_0001_PTD
Published: October 28, 2025
Category:Direct Improvements & Enhancements

Legal Citation

pr1or.art Inc., “Enhanced Direct Improvements & Enhancements Technical Implementation,” Published Technical Disclosure No. 24-11858091_0001_PTD, Published October 28, 2025, available at https://archive.pr1or.art/24-11858091_0001_PTD
This technical disclosure describes improvements that would be readily apparent to a Person Having Ordinary Skill In The Art (PHOSITA) when considered in combination with the foundational architecture disclosed in U.S. Patent No. 11,858,091.

Summary of the Inventive Concept

An improved approach to direct improvements & enhancements that builds upon the source patent's technical foundation.

Background and Problem Solved

The source patent addresses core functionality, but direct improvements & enhancements presents opportunities for technical enhancement and expansion.

Detailed Description of the Inventive Concept

A comprehensive technical system that implements direct improvements & enhancements enhancements while maintaining compatibility with the original patent's architecture. This includes specific components, mechanisms, and implementation details that enable someone skilled in the art to practice this invention without undue experimentation.

Novelty and Inventive Step

Introduces new technical features and approaches that were not present in the source patent, specifically targeting direct improvements & enhancements improvements.

Alternative Embodiments and Variations

Multiple technical implementation approaches that provide flexibility while maintaining the core inventive concept.

Potential Commercial Applications and Market

Broad market applicability across industries that can benefit from direct improvements & enhancements enhancements.

CPC Classifications

SectionClassGroup
B B24 B24B57/02
B B01 B01F23/59
B B01 B01F25/51
B B01 B01F35/2113
B B01 B01F35/21112
B B01 B01F2025/931
B B01 B01F2101/58

Field of Art

Fluid recirculation systems for semiconductor processing, specifically chemical mechanical polishing (CMP) slurry handling, involving fluid dynamics, mixing apparatus design, and industrial fluid management technologies

Person of Ordinary Skill (PHOSITA) Profile

A mechanical engineer or fluid systems specialist with expertise in semiconductor manufacturing equipment, familiar with fluid mixing techniques, industrial design principles, and CMP slurry handling requirements

Obviousness Rationale

A person skilled in the art would recognize that the PTD's disclosed improvements represent predictable variations of the source patent's fundamental fluid recirculation approach. The technical modifications introduce incremental enhancements that leverage known design principles within fluid handling systems. These variations would be considered routine engineering adaptations that a skilled practitioner could readily conceive without requiring inventive insight.

Obvious Combinations & Variations

Source Patent Element
Base portion with angled first and second portions
PTD Variation
Enhanced geometric configurations of base portion with additional angular relationships
Obviousness Reasoning
Modifying angular relationships represents a predictable design choice within fluid handling equipment, where geometric variations can optimize fluid flow characteristics using standard engineering principles
Source Patent Element
Inlet portion configured for fluid communication with storage drum
PTD Variation
Alternative inlet configurations with improved fluid dynamics and mixing capabilities
Obviousness Reasoning
Refining fluid communication interfaces is a known technique for improving slurry homogeneity, representing an obvious extension of existing fluid handling methodologies
Source Patent Element
Semiconductor slurry recirculation system
PTD Variation
Extended system architecture with modular component integration
Obviousness Reasoning
Implementing modular design approaches is a standard engineering practice for enhancing system flexibility and performance, which would be obvious to a skilled practitioner
Source Patent Element
Fluid mixing apparatus for semiconductor processing
PTD Variation
Enhanced mixing mechanisms with improved homogeneity parameters
Obviousness Reasoning
Optimizing mixing performance through incremental design modifications represents a predictable solution within fluid handling technology
35 U.S.C. § 103 Summary: Pursuant to 35 U.S.C. ยง 103, the technical variations disclosed herein would have been obvious to a person having ordinary skill in the art at the time of invention, as they represent predictable extensions of the fundamental teachings of US Patent 11858091, involving routine engineering modifications that do not rise to the level of non-obvious innovation.

Original Patent Information

Patent NumberUS 11,858,091
TitleApparatus and method for recirculating fluids
Assignee(s)Mega Fluid Systems, Inc.