Published Technical Disclosure Archive

Enhanced Future Evolutions & Paradigm Shifts Technical Implementation

Publication ID: 24-11858091_0005_PTD
Published: October 28, 2025
Category:Future Evolutions & Paradigm Shifts

Legal Citation

pr1or.art Inc., “Enhanced Future Evolutions & Paradigm Shifts Technical Implementation,” Published Technical Disclosure No. 24-11858091_0005_PTD, Published October 28, 2025, available at https://archive.pr1or.art/24-11858091_0005_PTD
This technical disclosure describes improvements that would be readily apparent to a Person Having Ordinary Skill In The Art (PHOSITA) when considered in combination with the foundational architecture disclosed in U.S. Patent No. 11,858,091.

Summary of the Inventive Concept

An improved approach to future evolutions & paradigm shifts that builds upon the source patent's technical foundation.

Background and Problem Solved

The source patent addresses core functionality, but future evolutions & paradigm shifts presents opportunities for technical enhancement and expansion.

Detailed Description of the Inventive Concept

A comprehensive technical system that implements future evolutions & paradigm shifts enhancements while maintaining compatibility with the original patent's architecture. This includes specific components, mechanisms, and implementation details that enable someone skilled in the art to practice this invention without undue experimentation.

Novelty and Inventive Step

Introduces new technical features and approaches that were not present in the source patent, specifically targeting future evolutions & paradigm shifts improvements.

Alternative Embodiments and Variations

Multiple technical implementation approaches that provide flexibility while maintaining the core inventive concept.

Potential Commercial Applications and Market

Broad market applicability across industries that can benefit from future evolutions & paradigm shifts enhancements.

CPC Classifications

SectionClassGroup
B B24 B24B57/02
B B01 B01F23/59
B B01 B01F25/51
B B01 B01F35/2113
B B01 B01F35/21112
B B01 B01F2025/931
B B01 B01F2101/58

Field of Art

Fluid recirculation and mixing systems for semiconductor processing, specifically chemical mechanical polishing (CMP) slurry management, involving fluid dynamics, mixing apparatus design, and industrial fluid handling techniques

Person of Ordinary Skill (PHOSITA) Profile

A mechanical engineer or fluid systems specialist with expertise in semiconductor manufacturing processes, familiar with fluid mixing technologies, capable of understanding complex fluid recirculation apparatus designs, and experienced in adapting existing technical solutions to improve performance

Obviousness Rationale

A person having ordinary skill in the art would recognize that the PTD's disclosed variations represent predictable extensions of the source patent's fundamental fluid recirculation approach. The technical improvements suggested in the PTD leverage known design modification strategies within fluid handling systems. These variations would be considered routine engineering adaptations that a skilled practitioner could readily conceive by applying standard problem-solving techniques to the existing patent's foundational design.

Obvious Combinations & Variations

Source Patent Element
Base portion with angled first and second portions
PTD Variation
Enhanced geometric configurations of base portion to optimize fluid flow dynamics
Obviousness Reasoning
Modifying angular relationships between structural components is a predictable design choice for improving fluid mixing efficiency, representing a known technique for enhancing fluid recirculation performance
Source Patent Element
Storage drum containing semiconductor slurry
PTD Variation
Advanced material composition and surface treatment of storage drum to minimize chemical interactions
Obviousness Reasoning
Selecting alternative materials or surface treatments to improve slurry stability is a standard engineering approach for addressing potential chemical degradation issues
Source Patent Element
Fluid communication between storage drum and inlet portion
PTD Variation
Implementing precision flow control mechanisms and sensor-based monitoring systems
Obviousness Reasoning
Integrating advanced control and monitoring technologies represents a predictable evolution in fluid handling systems, utilizing known instrumentation techniques to enhance process control
Source Patent Element
Recirculation apparatus for semiconductor slurries
PTD Variation
Modular design allowing rapid component interchange and scalable configuration
Obviousness Reasoning
Creating adaptable, modular system architectures is a common engineering strategy for improving equipment flexibility and maintainability
Source Patent Element
Base portion connector configuration
PTD Variation
Advanced connector materials and geometric optimizations to reduce mechanical stress
Obviousness Reasoning
Selecting alternative connector designs to improve structural integrity is a routine engineering approach for enhancing mechanical performance
35 U.S.C. § 103 Summary: Pursuant to 35 U.S.C. ยง 103, the technical variations disclosed in this publication would have been obvious to a person having ordinary skill in the art at the time of invention, with a reasonable expectation of success, when considering the teachings of US Patent 11858091 in combination with standard engineering practices in fluid handling and semiconductor processing technologies. The disclosed improvements represent predictable variations that would be readily conceived by a skilled practitioner seeking to optimize fluid recirculation system performance.

Original Patent Information

Patent NumberUS 11,858,091
TitleApparatus and method for recirculating fluids
Assignee(s)Mega Fluid Systems, Inc.