Enhanced Direct Improvements & Enhancements Technical Implementation

Publication ID: 24-11858091_0006_PTD

Published: October 28, 2025

Category:Direct Improvements & Enhancements

Legal Citation

pr1or.art Inc., “Enhanced Direct Improvements & Enhancements Technical Implementation,” Published Technical Disclosure No. 24-11858091_0006_PTD, Published October 28, 2025, available at https://archive.pr1or.art/24-11858091_0006_PTD

This technical disclosure describes improvements that would be readily apparent to a Person Having Ordinary Skill In The Art (PHOSITA) when considered in combination with the foundational architecture disclosed in U.S. Patent No. 11,858,091.

Summary of the Inventive Concept

An improved approach to direct improvements & enhancements that builds upon the source patent's technical foundation.

Background and Problem Solved

The source patent addresses core functionality, but direct improvements & enhancements presents opportunities for technical enhancement and expansion.

Detailed Description of the Inventive Concept

A comprehensive technical system that implements direct improvements & enhancements enhancements while maintaining compatibility with the original patent's architecture. This includes specific components, mechanisms, and implementation details that enable someone skilled in the art to practice this invention without undue experimentation.

Novelty and Inventive Step

Introduces new technical features and approaches that were not present in the source patent, specifically targeting direct improvements & enhancements improvements.

Alternative Embodiments and Variations

Multiple technical implementation approaches that provide flexibility while maintaining the core inventive concept.

Potential Commercial Applications and Market

Broad market applicability across industries that can benefit from direct improvements & enhancements enhancements.

CPC Classifications

Section	Class	Group
B	B24	B24B57/02
B	B01	B01F23/59
B	B01	B01F25/51
B	B01	B01F35/2113
B	B01	B01F35/21112
B	B01	B01F2025/931
B	B01	B01F2101/58

Section 103 Obviousness Analysis (PHOSITA)

▼

Field of Art

Fluid recirculation systems for semiconductor processing, specifically chemical mechanical polishing (CMP) slurry handling, involving fluid dynamics, mixing apparatus design, and industrial fluid management technologies

Person of Ordinary Skill (PHOSITA) Profile

A mechanical engineer or fluid systems specialist with expertise in semiconductor manufacturing equipment, familiar with fluid mixing techniques, industrial fluid handling, and apparatus design for precision industrial processes

Obviousness Rationale

A person skilled in the art would recognize that the Published Technical Disclosure represents predictable variations and design extensions of the source patent's fundamental fluid recirculation apparatus. The disclosed improvements leverage standard engineering problem-solving approaches by introducing incremental modifications to the original system's structural and functional elements. These variations would be considered routine design optimization within the technical domain of semiconductor fluid handling systems.

Obvious Combinations & Variations

Source Patent Element

Base portion with angled first and second portions

PTD Variation

Enhanced geometric configurations of base portion with modified angular relationships

Obviousness Reasoning

Angle modifications represent predictable design variations that a PHOSITA would recognize as routine mechanical engineering problem-solving, involving known geometric transformation techniques

Source Patent Element

Fluid recirculation system for semiconductor slurries

PTD Variation

Extended implementation approaches targeting improved homogeneity and mixing efficiency

Obviousness Reasoning

Optimization of fluid mixing parameters is a standard engineering challenge with finite, predictable solution approaches known in the art

Source Patent Element

Storage drum containing semiconductor slurry

PTD Variation

Alternative drum configurations with enhanced material compatibility and fluid dynamics

Obviousness Reasoning

Material and geometric variations in fluid containment systems represent standard design iterations with expected, incremental improvements

Source Patent Element

Inlet portion configured for fluid communication

PTD Variation

Modified inlet geometries and flow management techniques

Obviousness Reasoning

Fluid flow path optimizations are considered routine engineering modifications with predictable performance outcomes

Source Patent Element

Connector coupling base portion components

PTD Variation

Alternative connector designs with enhanced structural and functional characteristics

Obviousness Reasoning

Connector design represents a known design space with multiple interchangeable implementation strategies

35 U.S.C. § 103 Summary: Pursuant to 35 U.S.C. § 103, the variations disclosed herein would have been obvious to a person having ordinary skill in the art at the time of invention, with a reasonable expectation of success, based on the teachings of US Patent 11858091 and the fundamental principles of semiconductor fluid handling system design. The Published Technical Disclosure demonstrates that the claimed variations represent predictable extensions of the prior art, achievable through routine engineering problem-solving techniques.

Original Patent Information

Patent Number	US 11,858,091
Title	Apparatus and method for recirculating fluids
Assignee(s)	Mega Fluid Systems, Inc.