Published Technical Disclosure Archive

Enhanced New Applications & Use Cases Technical Implementation

Publication ID: 24-11858091_0007_PTD
Published: October 28, 2025
Category:New Applications & Use Cases

Legal Citation

pr1or.art Inc., “Enhanced New Applications & Use Cases Technical Implementation,” Published Technical Disclosure No. 24-11858091_0007_PTD, Published October 28, 2025, available at https://archive.pr1or.art/24-11858091_0007_PTD
This technical disclosure describes improvements that would be readily apparent to a Person Having Ordinary Skill In The Art (PHOSITA) when considered in combination with the foundational architecture disclosed in U.S. Patent No. 11,858,091.

Summary of the Inventive Concept

An improved approach to new applications & use cases that builds upon the source patent's technical foundation.

Background and Problem Solved

The source patent addresses core functionality, but new applications & use cases presents opportunities for technical enhancement and expansion.

Detailed Description of the Inventive Concept

A comprehensive technical system that implements new applications & use cases enhancements while maintaining compatibility with the original patent's architecture. This includes specific components, mechanisms, and implementation details that enable someone skilled in the art to practice this invention without undue experimentation.

Novelty and Inventive Step

Introduces new technical features and approaches that were not present in the source patent, specifically targeting new applications & use cases improvements.

Alternative Embodiments and Variations

Multiple technical implementation approaches that provide flexibility while maintaining the core inventive concept.

Potential Commercial Applications and Market

Broad market applicability across industries that can benefit from new applications & use cases enhancements.

CPC Classifications

SectionClassGroup
B B24 B24B57/02
B B01 B01F23/59
B B01 B01F25/51
B B01 B01F35/2113
B B01 B01F35/21112
B B01 B01F2025/931
B B01 B01F2101/58

Field of Art

Fluid recirculation systems and mixing technologies for semiconductor processing, specifically chemical mechanical planarization (CMP) slurry handling, involving fluid dynamics, mixing apparatus design, and industrial fluid management

Person of Ordinary Skill (PHOSITA) Profile

A mechanical engineer or fluid systems specialist with expertise in semiconductor manufacturing processes, familiar with fluid mixing technologies, capable of designing recirculation systems, and understanding fluid homogeneity requirements

Obviousness Rationale

A PHOSITA would recognize that the PTD's disclosed variations represent predictable extensions of the source patent's core fluid recirculation technology, utilizing standard engineering design techniques to adapt the original apparatus for alternative use cases while maintaining fundamental structural and functional principles.

Obvious Combinations & Variations

Source Patent Element
Base portion with angled first and second portions connected by a connector
PTD Variation
Modifying base portion angle ranges and connector configurations to suit different fluid handling requirements
Obviousness Reasoning
Angle adjustments represent a routine design choice for optimizing fluid flow characteristics, well within a PHOSITA's capabilities
Source Patent Element
Storage drum containing semiconductor slurry
PTD Variation
Expanding slurry storage and recirculation concepts to alternative industrial fluid management scenarios
Obviousness Reasoning
Transferring mixing apparatus principles across related technical domains constitutes a known technique for technological adaptation
Source Patent Element
Fluid communication mechanisms between storage and recirculation apparatus
PTD Variation
Implementing enhanced inlet/outlet configurations to improve fluid homogeneity and transfer efficiency
Obviousness Reasoning
Incremental improvements to fluid transfer mechanisms represent predictable results achievable through standard engineering iteration
Source Patent Element
Semiconductor slurry recirculation system
PTD Variation
Generalizing apparatus design for broader industrial fluid mixing applications beyond semiconductor processing
Obviousness Reasoning
Expanding technical solutions across related fields is a standard approach for technological innovation driven by fundamental design principles
Source Patent Element
Apparatus for achieving fluid homogeneity
PTD Variation
Introducing alternative mixing mechanisms and geometrical configurations to enhance fluid blending
Obviousness Reasoning
Exploring finite design variations to improve mixing performance represents an obvious approach for a skilled practitioner
35 U.S.C. § 103 Summary: Based on the teachings of US Patent 11858091, a Person Having Ordinary Skill In The Art would find the technical variations disclosed herein to be obvious extensions of the prior art, representing predictable adaptations of known fluid recirculation technologies through routine engineering design choices that would be apparent to a skilled practitioner in the field of industrial fluid management and semiconductor processing systems.

Original Patent Information

Patent NumberUS 11,858,091
TitleApparatus and method for recirculating fluids
Assignee(s)Mega Fluid Systems, Inc.