Published Technical Disclosure Archive

Enhanced Direct Improvements & Enhancements Technical Implementation

Publication ID: 24-11858092_0001_PTD
Published: October 28, 2025
Category:Direct Improvements & Enhancements

Legal Citation

pr1or.art Inc., “Enhanced Direct Improvements & Enhancements Technical Implementation,” Published Technical Disclosure No. 24-11858092_0001_PTD, Published October 28, 2025, available at https://archive.pr1or.art/24-11858092_0001_PTD
This technical disclosure describes improvements that would be readily apparent to a Person Having Ordinary Skill In The Art (PHOSITA) when considered in combination with the foundational architecture disclosed in U.S. Patent No. 11,858,092.

Summary of the Inventive Concept

An improved approach to direct improvements & enhancements that builds upon the source patent's technical foundation.

Background and Problem Solved

The source patent addresses core functionality, but direct improvements & enhancements presents opportunities for technical enhancement and expansion.

Detailed Description of the Inventive Concept

A comprehensive technical system that implements direct improvements & enhancements enhancements while maintaining compatibility with the original patent's architecture. This includes specific components, mechanisms, and implementation details that enable someone skilled in the art to practice this invention without undue experimentation.

Novelty and Inventive Step

Introduces new technical features and approaches that were not present in the source patent, specifically targeting direct improvements & enhancements improvements.

Alternative Embodiments and Variations

Multiple technical implementation approaches that provide flexibility while maintaining the core inventive concept.

Potential Commercial Applications and Market

Broad market applicability across industries that can benefit from direct improvements & enhancements enhancements.

CPC Classifications

SectionClassGroup
B B24 B24B7/228
B B24 B24B7/04
B B24 B24B49/02
B B24 B24B49/12
H H01 H01L21/304
H H01 H01L21/6836
H H01 H01L22/26
H H01 H01L2221/68327

Field of Art

Semiconductor substrate processing and precision grinding systems, involving advanced manufacturing techniques for thin substrate preparation, with expertise in mechanical engineering, materials science, and semiconductor fabrication processes

Person of Ordinary Skill (PHOSITA) Profile

A skilled engineer with advanced degree in mechanical or materials engineering, 3-5 years experience in semiconductor equipment design, familiar with precision grinding techniques, substrate handling mechanisms, and semiconductor manufacturing tolerances

Obviousness Rationale

The PTD presents incremental technical variations that a skilled practitioner would recognize as straightforward extensions of the source patent's substrate processing system. These variations represent predictable engineering solutions using known techniques in substrate handling and precision grinding. A PHOSITA would understand how to implement these enhancements by applying standard design optimization principles to the existing substrate processing architecture.

Obvious Combinations & Variations

Source Patent Element
Substrate holder with chuck and chuck table for holding substrates during grinding process
PTD Variation
Enhanced substrate holder with additional alignment and positioning mechanisms to improve grinding precision
Obviousness Reasoning
Implementing more sophisticated alignment features is a predictable design improvement that would be obvious to optimize substrate flatness and grinding accuracy
Source Patent Element
Grinder with rough and fine grinding stages
PTD Variation
Advanced multi-stage grinding approach with enhanced control parameters and adaptive grinding parameters
Obviousness Reasoning
Refining grinding stages through dynamic parameter adjustment represents a known technique for improving manufacturing precision in semiconductor processing
Source Patent Element
Adjustment device for modifying substrate holder inclination
PTD Variation
Expanded adjustment mechanism with more granular positioning capabilities and integrated feedback systems
Obviousness Reasoning
Introducing more sophisticated adjustment mechanisms is a standard engineering approach to improving system performance using well-understood control techniques
Source Patent Element
Substrate processing system with rotation shaft and grinding components
PTD Variation
Enhanced rotation and positioning system with improved vibration dampening and precision tracking
Obviousness Reasoning
Implementing advanced mechanical stabilization techniques represents a predictable solution for improving grinding system performance
Source Patent Element
Basic substrate processing configuration
PTD Variation
Modular system design allowing rapid reconfiguration and adaptation to different substrate types
Obviousness Reasoning
Creating flexible manufacturing systems through modular design is a standard engineering approach for expanding equipment versatility
35 U.S.C. § 103 Summary: Based on the teachings of US Patent 11858092, the present technical disclosure demonstrates that the claimed variations would have been obvious to a person having ordinary skill in the art at the time of invention. The incremental improvements represent predictable engineering solutions that would be readily conceived by a skilled practitioner seeking to optimize substrate processing systems through standard design techniques and known manufacturing methodologies.

Original Patent Information

Patent NumberUS 11,858,092
TitleSubstrate processing system, substrate processing method and computer-readable recording medium
Assignee(s)Honda Motor Co., Ltd.