Published Technical Disclosure Archive

Enhanced New Applications & Use Cases Technical Implementation

Publication ID: 24-11858092_0002_PTD
Published: October 28, 2025
Category:New Applications & Use Cases

Legal Citation

pr1or.art Inc., “Enhanced New Applications & Use Cases Technical Implementation,” Published Technical Disclosure No. 24-11858092_0002_PTD, Published October 28, 2025, available at https://archive.pr1or.art/24-11858092_0002_PTD
This technical disclosure describes improvements that would be readily apparent to a Person Having Ordinary Skill In The Art (PHOSITA) when considered in combination with the foundational architecture disclosed in U.S. Patent No. 11,858,092.

Summary of the Inventive Concept

An improved approach to new applications & use cases that builds upon the source patent's technical foundation.

Background and Problem Solved

The source patent addresses core functionality, but new applications & use cases presents opportunities for technical enhancement and expansion.

Detailed Description of the Inventive Concept

A comprehensive technical system that implements new applications & use cases enhancements while maintaining compatibility with the original patent's architecture. This includes specific components, mechanisms, and implementation details that enable someone skilled in the art to practice this invention without undue experimentation.

Novelty and Inventive Step

Introduces new technical features and approaches that were not present in the source patent, specifically targeting new applications & use cases improvements.

Alternative Embodiments and Variations

Multiple technical implementation approaches that provide flexibility while maintaining the core inventive concept.

Potential Commercial Applications and Market

Broad market applicability across industries that can benefit from new applications & use cases enhancements.

CPC Classifications

SectionClassGroup
B B24 B24B7/228
B B24 B24B7/04
B B24 B24B49/02
B B24 B24B49/12
H H01 H01L21/304
H H01 H01L21/6836
H H01 H01L22/26
H H01 H01L2221/68327

Field of Art

Semiconductor substrate processing and precision grinding technologies, specifically focused on substrate thinning systems with advanced alignment and grinding mechanisms for semiconductor manufacturing

Person of Ordinary Skill (PHOSITA) Profile

A mechanical engineer or materials processing specialist with expertise in semiconductor fabrication, precision machining, substrate handling, and grinding technologies, typically holding a Master's degree with 3-5 years of industrial experience in semiconductor equipment design

Obviousness Rationale

A PHOSITA would recognize that the PTD's disclosed variations represent predictable extensions of the source patent's substrate processing system, utilizing known techniques of modular component design and systematic performance enhancement in semiconductor manufacturing equipment. The technical improvements suggested in the PTD would be considered routine optimization and design adaptation within the established technological framework of the original patent. These variations demonstrate incremental advancements that a skilled practitioner would naturally explore when seeking to improve substrate processing capabilities.

Obvious Combinations & Variations

Source Patent Element
Substrate holder with chuck and chuck table for holding substrates during grinding process
PTD Variation
Enhanced substrate holder with additional alignment mechanisms and modular component interfaces for improved precision and adaptability
Obviousness Reasoning
Modular design and precision alignment are standard design approaches in semiconductor equipment, representing a predictable variation that would be obvious to implement for improved processing performance
Source Patent Element
Grinding system with rough and fine grinding stages
PTD Variation
Extended grinding methodology incorporating adaptive grinding parameters and multi-stage processing optimization
Obviousness Reasoning
Refinement of grinding techniques through parameter adjustment is a known method for improving substrate processing, representing a logical and predictable technical evolution
Source Patent Element
Adjustment device for managing substrate holder inclination
PTD Variation
Advanced adjustment mechanisms with enhanced multi-axis movement and real-time calibration capabilities
Obviousness Reasoning
Implementing more sophisticated alignment technologies is a standard approach for incremental improvement in precision manufacturing equipment, representing an obvious technical progression
Source Patent Element
Substrate processing system with rotation and grinding components
PTD Variation
Expanded system architecture supporting multiple substrate types and enhanced processing flexibility
Obviousness Reasoning
Developing more versatile processing systems by generalizing component designs is a routine engineering approach that would be obvious to a skilled practitioner
Source Patent Element
Basic substrate thinning methodology
PTD Variation
Integrated process control and adaptive processing techniques for improved substrate quality and manufacturing consistency
Obviousness Reasoning
Implementing closed-loop process control and adaptive manufacturing techniques represents a predictable technological advancement in semiconductor equipment design
35 U.S.C. § 103 Summary: Based on a comprehensive analysis of US Patent 11858092 and the corresponding Published Technical Disclosure, a Person Having Ordinary Skill In The Art would find the disclosed technical variations to be obvious extensions of the prior art, representing routine engineering adaptations that do not rise to the level of non-obvious innovation. The systematic improvements and design modifications described herein would be considered predictable variations within the established technological domain of semiconductor substrate processing systems.

Original Patent Information

Patent NumberUS 11,858,092
TitleSubstrate processing system, substrate processing method and computer-readable recording medium
Assignee(s)Honda Motor Co., Ltd.