Published Technical Disclosure Archive

Enhanced Direct Improvements & Enhancements Technical Implementation

Publication ID: 24-11858092_0006_PTD
Published: October 28, 2025
Category:Direct Improvements & Enhancements

Legal Citation

pr1or.art Inc., “Enhanced Direct Improvements & Enhancements Technical Implementation,” Published Technical Disclosure No. 24-11858092_0006_PTD, Published October 28, 2025, available at https://archive.pr1or.art/24-11858092_0006_PTD
This technical disclosure describes improvements that would be readily apparent to a Person Having Ordinary Skill In The Art (PHOSITA) when considered in combination with the foundational architecture disclosed in U.S. Patent No. 11,858,092.

Summary of the Inventive Concept

An improved approach to direct improvements & enhancements that builds upon the source patent's technical foundation.

Background and Problem Solved

The source patent addresses core functionality, but direct improvements & enhancements presents opportunities for technical enhancement and expansion.

Detailed Description of the Inventive Concept

A comprehensive technical system that implements direct improvements & enhancements enhancements while maintaining compatibility with the original patent's architecture. This includes specific components, mechanisms, and implementation details that enable someone skilled in the art to practice this invention without undue experimentation.

Novelty and Inventive Step

Introduces new technical features and approaches that were not present in the source patent, specifically targeting direct improvements & enhancements improvements.

Alternative Embodiments and Variations

Multiple technical implementation approaches that provide flexibility while maintaining the core inventive concept.

Potential Commercial Applications and Market

Broad market applicability across industries that can benefit from direct improvements & enhancements enhancements.

CPC Classifications

SectionClassGroup
B B24 B24B7/228
B B24 B24B7/04
B B24 B24B49/02
B B24 B24B49/12
H H01 H01L21/304
H H01 H01L21/6836
H H01 H01L22/26
H H01 H01L2221/68327

Field of Art

Semiconductor substrate processing and precision grinding systems, involving advanced manufacturing techniques for thin substrate preparation, with expertise in mechanical engineering, precision machining, and semiconductor fabrication processes

Person of Ordinary Skill (PHOSITA) Profile

A skilled engineer with advanced degree in mechanical or materials engineering, 5-7 years experience in semiconductor equipment design, familiar with precision grinding techniques, substrate handling mechanisms, and semiconductor manufacturing tolerances

Obviousness Rationale

The PTD presents incremental technical improvements that would be readily apparent to a skilled practitioner examining the source patent's substrate processing system. By applying standard engineering problem-solving approaches and known design optimization techniques, a PHOSITA would recognize the disclosed variations as straightforward extensions of the original patent's core technological framework. The enhancements represent predictable variations that emerge from routine design iteration and optimization processes within semiconductor manufacturing equipment development.

Obvious Combinations & Variations

Source Patent Element
Substrate holder with chuck and adjustment device for inclination control
PTD Variation
Enhanced adjustment mechanism with more granular positional control and expanded range of motion for substrate alignment
Obviousness Reasoning
Implementing more precise alignment mechanisms is a predictable design improvement using known mechanical engineering techniques, representing an obvious variation to optimize substrate positioning accuracy
Source Patent Element
Grinder with rough and fine grinding stages
PTD Variation
Advanced multi-stage grinding process with enhanced feedback and real-time adjustment capabilities
Obviousness Reasoning
Integrating sensor-based process control into existing grinding methodologies represents a standard engineering approach for incremental system performance improvement
Source Patent Element
Substrate processing system with rotation shaft and holder configuration
PTD Variation
Modified rotation mechanism with improved dynamic stabilization and reduced vibration characteristics
Obviousness Reasoning
Implementing vibration reduction techniques is a known approach in precision machining, representing an obvious optimization for a skilled practitioner
Source Patent Element
Substrate processing system with multiple adjustment shafts
PTD Variation
Extended adjustment mechanism with additional degrees of freedom and enhanced precision control
Obviousness Reasoning
Expanding mechanical adjustment capabilities through additional control points is a predictable design evolution using standard engineering problem-solving approaches
Source Patent Element
Substrate grinding system with protective tape handling
PTD Variation
Advanced tape management system with improved adhesion control and substrate interface optimization
Obviousness Reasoning
Refining substrate preparation techniques through incremental interface improvements represents a routine design optimization within semiconductor manufacturing processes
35 U.S.C. § 103 Summary: Based on a comprehensive analysis of US Patent 11858092 and the disclosed technical variations, a Person Having Ordinary Skill In The Art would find the presented improvements obvious and lacking inventive distinctiveness. The PTD demonstrates that the claimed technical enhancements represent predictable variations emerging from routine engineering problem-solving, thereby establishing a prima facie case of obviousness under 35 U.S.C. Section 103 and rendering potential derivative claims unpatentable.

Original Patent Information

Patent NumberUS 11,858,092
TitleSubstrate processing system, substrate processing method and computer-readable recording medium
Assignee(s)Honda Motor Co., Ltd.