Enhanced Synergistic Combinations Technical Implementation

Publication ID: 24-11858092_0008_PTD
Published: October 28, 2025
Category:Synergistic Combinations

Legal Citation

pr1or.art Inc., “Enhanced Synergistic Combinations Technical Implementation,” Published Technical Disclosure No. 24-11858092_0008_PTD, Published October 28, 2025, available at https://archive.pr1or.art/24-11858092_0008_PTD
This technical disclosure describes improvements that would be readily apparent to a Person Having Ordinary Skill In The Art (PHOSITA) when considered in combination with the foundational architecture disclosed in U.S. Patent No. 11,858,092.

Summary of the Inventive Concept

An improved approach to synergistic combinations that builds upon the source patent's technical foundation.

Background and Problem Solved

The source patent addresses core functionality, but synergistic combinations presents opportunities for technical enhancement and expansion.

Detailed Description of the Inventive Concept

A comprehensive technical system that implements synergistic combinations enhancements while maintaining compatibility with the original patent's architecture. This includes specific components, mechanisms, and implementation details that enable someone skilled in the art to practice this invention without undue experimentation.

Novelty and Inventive Step

Introduces new technical features and approaches that were not present in the source patent, specifically targeting synergistic combinations improvements.

Alternative Embodiments and Variations

Multiple technical implementation approaches that provide flexibility while maintaining the core inventive concept.

Potential Commercial Applications and Market

Broad market applicability across industries that can benefit from synergistic combinations enhancements.

CPC Classifications

SectionClassGroup
B B24 B24B7/228
B B24 B24B7/04
B B24 B24B49/02
B B24 B24B49/12
H H01 H01L21/304
H H01 H01L21/6836
H H01 H01L22/26
H H01 H01L2221/68327

Field of Art

Semiconductor substrate processing and precision grinding technologies, involving mechanical engineering, materials science, and semiconductor manufacturing techniques. Expertise requires advanced engineering degree, specialized knowledge in substrate handling, precision machining, and semiconductor fabrication processes

Person of Ordinary Skill (PHOSITA) Profile

A skilled engineer with graduate-level training in mechanical engineering or materials science, experienced in semiconductor substrate processing, familiar with precision grinding techniques, CNC machining principles, and substrate handling mechanisms

Obviousness Rationale

The Published Technical Disclosure presents synergistic combinations that would be readily apparent to a skilled practitioner given the foundational teachings of the source patent. By leveraging known techniques in substrate processing and mechanical design, the PTD introduces incremental improvements that represent predictable variations within the established technological framework. A person skilled in the art would recognize these modifications as straightforward extensions of existing substrate processing methodologies.

Obvious Combinations & Variations

Source Patent Element
Substrate holder with chuck and chuck table for holding substrates during grinding process
PTD Variation
Enhanced substrate holder with additional alignment and adjustment mechanisms to improve precision and reduce mechanical tolerances
Obviousness Reasoning
Implementing refined alignment techniques represents a known design optimization strategy, utilizing standard mechanical engineering principles to incrementally improve substrate positioning accuracy
Source Patent Element
Grinding system with rough and fine grinding stages
PTD Variation
Introduction of adaptive grinding parameters that dynamically adjust grinding pressure and speed based on substrate characteristics
Obviousness Reasoning
Implementing real-time parameter adjustment is a predictable solution for improving grinding precision, utilizing standard control system techniques known in precision manufacturing
Source Patent Element
Rotation shaft connected to substrate holder
PTD Variation
Advanced rotation mechanism with integrated vibration dampening and precision alignment features
Obviousness Reasoning
Incorporating vibration control represents a standard engineering approach to improving machining precision, utilizing well-established mechanical design principles
Source Patent Element
Substrate processing system with multiple adjustment shafts
PTD Variation
Enhanced multi-axis adjustment system with computer-controlled positioning and real-time feedback mechanisms
Obviousness Reasoning
Integrating computer control with mechanical adjustment represents a predictable technological evolution, combining known control system techniques with existing mechanical design
Source Patent Element
Substrate grinding configuration
PTD Variation
Synergistic combination approach introducing modular component design allowing rapid reconfiguration of grinding system
Obviousness Reasoning
Developing modular system architectures is a standard engineering approach to increasing system flexibility, representing an obvious extension of existing design principles
35 U.S.C. § 103 Summary: Based on a comprehensive analysis of US Patent 11858092 and the corresponding Published Technical Disclosure, the claimed variations represent obvious extensions of prior art through standard engineering methodologies. A person having ordinary skill in the art would recognize these technical implementations as predictable combinations of known substrate processing techniques, thereby rendering such variations non-patentable under 35 U.S.C. Section 103 obviousness standards.

Original Patent Information

Patent NumberUS 11,858,092
TitleSubstrate processing system, substrate processing method and computer-readable recording medium
Assignee(s)Honda Motor Co., Ltd.