Enhanced Future Evolutions & Paradigm Shifts Technical Implementation
Legal Citation
Summary of the Inventive Concept
An improved approach to future evolutions & paradigm shifts that builds upon the source patent's technical foundation.
Background and Problem Solved
The source patent addresses core functionality, but future evolutions & paradigm shifts presents opportunities for technical enhancement and expansion.
Detailed Description of the Inventive Concept
A comprehensive technical system that implements future evolutions & paradigm shifts enhancements while maintaining compatibility with the original patent's architecture. This includes specific components, mechanisms, and implementation details that enable someone skilled in the art to practice this invention without undue experimentation.
Novelty and Inventive Step
Introduces new technical features and approaches that were not present in the source patent, specifically targeting future evolutions & paradigm shifts improvements.
Alternative Embodiments and Variations
Multiple technical implementation approaches that provide flexibility while maintaining the core inventive concept.
Potential Commercial Applications and Market
Broad market applicability across industries that can benefit from future evolutions & paradigm shifts enhancements.
Section 103 Obviousness Analysis (PHOSITA)
Field of Art
Additive Manufacturing and Computer-Aided Manufacturing Systems, specifically involving multi-beam energy path optimization and manufacturing process control
Person of Ordinary Skill (PHOSITA) Profile
A skilled engineer with expertise in additive manufacturing technologies, computer-aided design, energy beam path algorithms, and manufacturing process optimization, typically holding a master's degree in mechanical engineering or materials science with 3-5 years of specialized experience
Obviousness Rationale
A person having ordinary skill in the art would recognize that the PTD represents predictable variations and extensions of the source patent's core technical approach to multi-beam energy path optimization. The disclosed future evolutions naturally emerge from combining known techniques in additive manufacturing process control with the foundational method described in the source patent. These variations represent incremental improvements that would be apparent to a skilled practitioner seeking to enhance manufacturing precision and efficiency.
Obvious Combinations & Variations
Original Patent Information
| Patent Number | US 11,858,217 |
|---|---|
| Title | Methods of determining an interlace path for an additive manufacturing machine |
| Assignee(s) | Concept Laser GmbH |